LEVEL 59 UC Berkeley BSIM3-SOI FD Model

The UC Berkeley SOI (BSIM3-SOI) Fully Depleted (FD) model is now installed in Star-Hspice as LEVEL 59. This model is described in the "BSIM3SOI FD2.1 MOSFET MODEL User Manual," which can be found at "http://www-device.eecs.berkeley.edu/~bsim3soi".

The general syntax for including a BSIM3-SOI FD MOSFET element in a Star-Hspice netlist is:

General Form
Mxxx nd ng ns ne <np> mname <L=val>
+ <W=val> <M=val> <AD=val> <AS=val> <PD=val> <PS=val>
+ <NRD=val> <NRS=val> <NRB=val> <RTH0=val> <CTH0=val>
+ <off> <BJToff=val> <IC=Vds, Vgs, Vbs, Ves, Vps>

where the angle brackets indicate optional parameters.

The arguments are as follows:

Mxxx

SOI MOSFET element name. Must begin with M, which can be followed by up to 1023 alphanumeric characters.

nd

Drain terminal node name or number

ng

Front gate node name or number

ns

Source terminal node name or number

ne

Back gate (or substrate) node name or number

np

Optional external body contact node name or number

mname

MOSFET model name reference

L

SOI MOSFET channel length in meters. This parameter overrides DEFL in an OPTIONS statement. Default=DEFL with a maximum of 0.1m.

W

MOSFET channel width in meters. This parameter overrides DEFW in an OPTIONS statement. Default=DEFW.

M

Multiplier to simulate multiple SOI MOSFETs in parallel. All channel widths, diode leakages, capacitances and resistances are affected by the setting of M. Default=1.

AD

Drain diffusion area. Overrides DEFAD in the OPTIONS statement. Default=DEFAD.

AS

Source diffusion area. Overrides DEFAS in the OPTIONS statement. Default=DEFAS.

PD

Perimeter of the drain junction, including the channel edge. Overrides DEFPD in the OPTIONS statement.

PS

Perimeter of the source junction, including the channel edge. Overrides DEFPS in the OPTIONS statement.

NRD

Number of squares of drain diffusion for drain series resistance. Overrides DEFNRD in the OPTIONS statement.

NRS

Number of squares of source diffusion for source series resistance. Overrides DEFNRS in the OPTIONS statement.

NRB

Number of squares for body series resistance.

RTH0

Thermal resistance per unit width

  • If not specified, RTH0 is extracted from the model card.
  • If specified, it overrides the one in the model card.

CTH0

Thermal capacitance per unit width

  • If not specified, CTH0 is extracted from model card.
  • If specified, it overrides the one in the model card.

OFF

Sets initial condition to OFF for this element in DC analysis

BJTOFF

Turning off BJT if equal to 1

IC

Initial guess in the order (drain, front gate, internal body, back gate, external voltage). (Vps is ignored in the case of 4-terminal device) These are used when UIC is present in the .TRAN statement and are overridden by the .IC statement.

LEVEL 59 Model Parameters

Model Control Parameters

Parameter

Unit

Default

Description

CAPMOD

-

2

Flag for the short channel capacitance model

LEVEL

-

-

LEVEL 59 for BSIM3SOI

MOBMOD

-

1

Mobility model selector

NOIMOD

-

1

Flag for Noise model

SHMOD

-

0

Flag for self-heating:

0 - no self-heating
1 - self-heating

Process Parameters

Parameter

Unit

Default

Description

NCH

1/cm3

1.7e17

Channel doping concentration

NGATE

1/cm3

0

Poly gate doping concentration

NSUB

1/cm3

6.0e16

Substrate doping concentration

TBOX

m

3.0e-7

Buried oxide thickness

TOX

m

1.0e-8

Gate oxide thickness

TSI

m

1.0e-17

Silicon film thickness

DC Parameters

Parameter

Unit

Default

Description

A0

-

1.0

Bulk charge effect coefficient for channel length

A1

1/V

0.0

First non-saturation effect parameter

A2

-

1.0

Second non-saturation effect parameter

ABP

-

1.0

Coefficient of Abeff dependency on Vgst

ADICE0

-

1

DICE bulk charge factor

AGIDL

1/W

0.0

GIDL constant

AGS

1/V

0.0

Gate bias coefficient of Abulk

AII

1/V

0.0

First Leff dependence Vdsatii parameter

ALPHA0

m/V

0.0

The first parameter of impact ionization current

ALPHA1

1/V

1.0

The second parameter of impact ionization current

B0

m

0.0

Bulk charge effect coefficient for channel width

B1

m

0.0

Bulk charge effect width offset

BGIDL

V/m

0.0

GIDL exponential coefficient

BII

m/V

0.0

Second Leff dependence Vdsatii parameter

CDSC

F/m2

2.4e-4

Drain/source to channel coupling capacitance

CDSCB

F/m2

0

Body-bias sensitivity of cdsc

CDSCD

F/m2

0

Drain-bias sensitivity of cdsc

CII

-

0.0

First Vds dependence Vdsatii parameter

CIT

F/m2

0.0

Interface trap capacitance

DELP

V

0.02

Constant for limiting Vbseff to surface potential

DELTA

-

0.01

Effective Vds parameter

DII

V

-1.0

Second Vds dependence Vdsatii parameter

DROUT

-

0.56

L dependence coefficient of the DIBL correction parameter in Rout

DSUB

-

0.56

DIBL coefficient exponent

DVBD0

V

0

First coefficient of Vbs 0 dependency on Leff

DVBD1

V

0

Second coefficient of Vbs 0 dependency on Leff

DVT0

-

2.2

First coefficient of short-channel effect on Vth

DVT0W

-

0

First coefficient of narrow width effect on Vth for small channel length

DVT1

-

0.53

Second coefficient of short-channel effect on Vth

DVT1W

-

5.3e6

Second coefficient of narrow width effect on Vth for small channel length

DVT2

1/V

-0.032

Body-bias coefficient of short-channel effect on Vth

DVT2W

1/V

-0.032

Body-bias coefficient of narrow width effect on Vth for small channel length

DWB

m/V1/2

0.0

Coefficient of Weff's substrate body bias dependence

DWG

m/V

0.0

Coefficient of Weff's gate dependence

EDL

m

2e-6

Electron diffusion length

ETA0

-

0.08

DIBL coefficient in the subthreshold region

ETAB

1/V

-0.07

Body-bias coefficient for the subthreshold DIBL effect

ISBJT

A/m2

1.0e-6

BJT injection saturation current

ISDIF

A/m2

0

Body to source/drain injection saturation current

ISREC

A/m2

1.0e-5

Recombination in depletion saturation current

ISTUN

A/m2

0.0

Reverse tunneling saturation current

K1

V1/2

0.6

First-order body effect coefficient

K2

-

0

Second-order body effect coefficient

K3

-

0

Narrow coefficient

K3B

1/V

0

Body effect coefficient of k3

KB1

-

1

Coefficient of Vbs 0 dependency on Vgbs

KB3

-

1

Coefficient of Vbs 0 dependency on Vgs at subthreshold region

KBJT1

m/V

0

Parasitic bipolar early effect coefficient

KETA

m

-0.6

Body-bias coefficient of bulk charge effect

LINT

m

0.0

Length offset fitting parameter from I-V without bias

MXC

-

-0.9

Fitting parameter for Abeff calculation

NDIODE

-

1.0

Diode non-ideality factor

NFACTOR

-

1

Subthreshold swing factor

NGIDL

V

1.2

GIDL Vds enhancement coefficient

NLX

m

1.74e-7

Lateral non-uniform doping parameter

NTUN

-

10.0

Reverse tunneling non-ideality factor

PCLM

-

1.3

Channel length modulation parameter

PDIBL1

-

0.39

First output resistance DIBL effect correction parameter

PDIBL2

-

0.0086

Second output resistance DIBL effect correction parameter

PRWB

1/V1

0

Body effect coefficient of Rdsw

PRWG

1/V1/2

0

Gate bias effect coefficient of Rdsw

PVAG

 

0.0

Gate dependence of Early voltage

RBODY

ohm/m2

0.0

Intrinsic body contact sheet resistance

RBSH

ohm/m2

0.0

Extrinsic body contact sheet resistance

RDSW

 

100

Parasitic resistance per unit width

RSH

ohm/square

0.0

Source/drain sheet resistance in ohm per square

U0

cm2/(V-sec)

NMOS-670 PMOS-250

Mobility at Temp=Tnom

UA

m/V

2.25e-9

First-order mobility degradation coefficient

UB

(m/V)2

5.87e-19

Second-order mobility degradation coefficient

UC

1/V

-0.0465

Body-effect of mobility degradation coefficient

VBSA

V

0

Transition body voltage offset

VOFF

v

-0.08

Offset voltage in the subthreshold region for large W and L

VSAT

m/sec

8e4

Saturation velocity at Temp=Tnom

VTH0

v

NMOS 0.7
PMOS -0.7

Threshold voltage @ Vbs=0 for long wide device

W0

m

0

Narrow width parameter

WINT

m

0.0

Width offset fitting parameter from I-V without bias

WR

-

1

Width offset from Weff for Rds calculation

AC and Capacitance Parameters

Parameter

Unit

Default

Description

ASD

V

0.3

Source/drain bottom diffusion smoothing parameter

CF

F/m

cal.

Gate to source/drain fringing field capacitance

CGDL

F/m

0.0

Lightly doped drain-gate region overlap capacitance

CGDO

F/m

calculated

Non LDD region drain-gate overlap capacitance per channel length

CGEO

F/m

0.0

Gate-substrate overlap capacitance per channel length

CGSL

F/m

0.0

Lightly doped source-gate region overlap capacitance

CGSO

F/m

calculated

Non LDD region source-gate overlap capacitance per channel length

CJSWG

F/m2

1.e-10

Source/drain (gate side) sidewall junction capacitance per unit width (normalized to 100nm Tsi)

CKAPPA

F/m

0.6

Coefficient for lightly doped region overlap capacitance fringing field capacitance

CLC

m

0.1e-7

Constant term for the short channel model

CLE

-

0.0

Exponential term for the short channel model

CSDESW

F/m

0.0

Source/drain sidewall fringing capacitance per unit length

CSDMIN

V

cal.

Source/drain bottom diffusion minimum capacitance

DLC

m

lint

Length offset fitting parameter for gate charge

DWC

m

wint

Width offset fitting parameter from C-V

MJSWG

V

0.5

Source/drain (gate side) sidewall junction capacitance grading coefficient

PBSWG

V

0.7

Source/drain (gate side) sidewall junction capacitance built in potential

TT

second

1ps

Diffusion capacitance transit time coefficient

VSDFB

V

cal.

Source/drain bottom diffusion capacitance flatband voltage

VSDTH

V

cal.

Source/drain bottom diffusion capacitance threshold voltage

XPART

-

0

Charge partitioning rate flag

Temperature Parameters

Parameter

Unit

Default

Description

AT

m/sec

3.3e4

Temperature coefficient for Ua

CTH0

moC/(W*s)

0

Normalized thermal capacity

KT1

V

-0.11

Temperature coefficient for the threshold voltage

KT2

-

0.022

Body-bias coefficient of the threshold voltage temperature effect

KTIL

V*m

0

Channel length dependence of the temperature coefficient for the threshold voltage

PRT

-um

0

Temperature coefficient for R dsw

RTH0

moC/W

0

Normalized thermal resistance

TNOM

oC

25

Temperature at which parameters are expected

UA1

m/V

4.31e-9

Temperature coefficient for Ua

UB1

(m/V)2

-7.61e-18

Temperature coefficient for Ub

UC1

1/V

-0.056

Temperature coefficient for Uc

UTE

-

-1.5

Mobility temperature exponent

XBJT

-

1

Power dependence of jbjt on temperature

XDIF

-

XBJT

Power dependence of jdif on temperature

XREC

-

1

Power dependence of jrec on temperature

XTUN

-

0

Power dependence of jtun on temperature


NOTE: BSIMFD refers substrate to the silicon below buried oxide, not the well region in BSIM3. It is used to calculated backgate flatband voltage (V fbb ) and parameters related to source/drain diffusion bottom capacitance (V sdth , V sdfb , C sdmin ). Positive nsub means the same type of doping as the body and negative nsub means opposite type of doping.

LEVEL 59 Template Output

Additional element templates are added to this model for output of state variables, stored charges, capacitor currents and capacitances.

BSIM3SOI MOSFET FD (LEVEL 59) Template Output

Name

Alias

Description

L

LV1

Channel length (L)

W

LV2

Channel width (W)

AD

LV3

Area of the drain diode (AD)

AS

LV4

Area of the source diode (AS)

ICVDS

LV5

Initial condition for drain-source voltage (VDS)

ICVGS

LV6

Initial condition for gate-source voltage (VGS)

ICVES

LV7

Initial condition for Substrate-source voltage (VES)

VTH

LV9

Threshold voltage (bias dependent)

VDSAT

LV10

Saturation voltage (VDSAT)

PD

LV11

Drain diode periphery (PD)

PS

LV12

Source diode periphery (PS)

RDS

LV13

Drain resistance (squares) (RDS)

RSS

LV14

Source resistance (squares) (RSS)

GDEFF

LV16

Effective drain conductance (1/RDeff)

GSEFF

LV17

Effective source conductance (1/RSeff)

COVLGS

LV36

Gate-source overlap capacitance

COVLGD

LV37

Gate-drain overlap capacitance

COVLGE

LV38

Gate-substrate overlap capacitance

VES

LX1

Substrate-source voltage (VES)

VGS

LX2

Gate-source voltage (VGS)

VDS

LX3

Drain-source voltage (VDS)

CDO

LX4

DC drain current (CDO)

CBSO

LX5

DC source-body diode current (CBSO)

CBDO

LX6

DC drain-body diode current (CBDO)

GMO

LX7

DC gate transconductance (GMO)

GDSO

LX8

DC drain-source conductance (GDSO)

GMESO

LX9

DC substrate transconductance (GMBSO)

GBDO

LX10

Conductance of the drain diode (GBDO)

GBSO

LX11

Conductance of the source diode (GBSO)

Meyer and Charge Conservation Model Parameters

Name

Alias

Description

QB

LX12

Body charge (QB)

CQB

LX13

Body charge current (CQB)

QG

LX14

Gate charge (QG)

CQG

LX15

Gate charge current (CQG)

QD

LX16

Channel charge (QD)

CQD

LX17

Channel charge current (CQD)

CGGBO

LX18

= CGS + CGD + CGB

CGDBO

LX19

, (for Meyer CGD=-CGDBO)

CGSBO

LX20

, (for Meyer CGS=-CGSBO)

CBGBO

LX21

, (for Meyer CGB=-CBGBO)

CBDBO

LX22

 

CBSBO

LX23

 

CDGBO

LX32

 

CDDBO

LX33

 

CDSBO

LX34

 

QE

LX35

Substrate charge (QE)

CQE

LX36

Substrate charge current (CQE)

CDEBO

LX37

 

CBEBO

LX38

 

CEEBO

LX39

 

CEGBO

LX40

 

CEDBO

LX41

 

CESBO

LX42

 

VBS

LX43

Body-source voltage (VBS)

ICH

LX44

Channel current

IBJT

LX45

Parasitic BJT collector current

III

LX46

Impact Ionization current

IGIDL

LX47

GIDL current

ITUN

LX48

Tunneling current

Star-Hspice Manual - Release 2001.2 - June 2001